Formation of nanocrystalline NiCr-N films by reactive dc magnetron sputtering

The article reports on structure and hardness of NiCr-N films prepared by de reactive magnetron sputtering of NiCr (80/20 wt. %) target in a mixture of Ar and N-2 On glass and 15 330 steel substrates at room temperature using a round planar magnetron of diameter 75 mm: It was found that while pure NiCr films are polycrystalline, an addition of nitrogen into the film reduces a grain size d and makes it possible to form nanocrystalline NiCr-N films. The hardness HV of the NiCr-N film increases with decreasing grain size d but only down to about 7 nm. For grains smaller than 7 nm the hardness HV decreases. (C) 1998 American Vacuum Society. [S0734-2101(98)02606-2].