MODIFICATION OF THE GRAIN-SIZE OF SPUTTERED COPPER WITH ADDITIONS OF OXYGEN, KRYPTON, SILVER OR YTTRIUM

被引：8

作者：

MOSS, RW

MERZ, MD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572818

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2694 / 2699

页数：6

共 5 条

[1] KRYPTON ENTRAPMENT IN PULSE-BIASED SPUTTER-DEPOSITED METALS [J].

BAYNE, MA ;

MOSS, RW ;

MCCLANAHAN, ED .

[2] COPPER-BASED MATERIALS FORMED BY HIGH-RATE SPUTTERING [J].

BUSCH, R ;

MCCLANAHAN, ED .

[3]

EVANS JH, 1984, 12TH P ASTM S EFF RA

MERZ, MD ;

DAHLGREN, SD .

PATTEN, JW ;

MCCLANAHAN, ED ;

JOHNSTON, JW .