Focusing of hard x-rays to 16 nanometers with a multilayer Laue lens

被引：169

作者：

Kang, Hyon Chol ^{[1
]}

Yan, Hanfei ^{[1
]}

Winarski, Robert P. ^{[1
]}

Holt, Martin V. ^{[1
]}

Maser, Joerg ^{[1
]}

Liu, Chian ^{[2
]}

Conley, Ray ^{[2
]}

Vogt, Stefan ^{[2
]}

Macrander, Albert T. ^{[2
]}

Stephenson, G. Brian ^{[1
,3
]}

机构：

[1] Argonne Natl Lab, Ctr Nanoscale Mat, Argonne, IL 60439 USA

[2] Argonne Natl Lab, Xray Sci Div, Argonne, IL 60439 USA

[3] Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USA

来源：

APPLIED PHYSICS LETTERS | 2008年 / 92卷 / 22期

关键词：

D O I：

10.1063/1.2912503

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report improved results for hard x-ray focusing using a multilayer Laue lens (MLL). We have measured a line focus of 16 nm width with an efficiency of 31% at a wavelength lambda=0.064 nm (19.5 keV) using a partial MLL structure with an outermost zone width of 5 nm. The results are in good agreement with the theoretically predicted performance. (C) 2008 American Institute of Physics.

引用

页数：3

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