TEM characterization of nanodiamond thin films

被引:71
作者
Qin, LC [1 ]
Zhou, D [1 ]
Krauss, AR [1 ]
Gruen, DM [1 ]
机构
[1] Argonne Natl Lab, Div Mat & Chem Sci, Argonne, IL 60439 USA
来源
NANOSTRUCTURED MATERIALS | 1998年 / 10卷 / 04期
关键词
D O I
10.1016/S0965-9773(98)00092-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The microstructure of thin films grown by microwave plasma-enhanced chemical vapor deposition (MPCVD) from fullerene C-60 precursors has been characterized by scanning electron microscopy (SEM), selected-area electron diffraction (SAED), bright-field electron microscopy, high-resolution electron microscopy(HREM), and parallel electron energy-loss spectroscopy (PEELS). The films are composed of nanosize crystallites of diamond, and no graphitic or amorphous phases were observed. The diamond crystallite size measured from lattice images shows that most grains range between 3-5 rtm, reflecting a gamma distribution. SAED gave no evidence of either sp(2)-bonded glassy carbon or sp(3)-bonded diamondlike amorphous carbon. The sp(2)-bonded configuration found in PEELS was attributed to grain boundary carbon atoms, which constitute 5-10% of the total. Occasionally observed larger diamond grains tend to be highly faulted. (C) 1998 Acta Metallurgica Inc.
引用
收藏
页码:649 / 660
页数:12
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