Parameter change of magneto-plasma-dynamic arc-jet plasma on a flow-facing plate

被引：2

作者：

Ishiyama, O

Tamura, H

Sawaoka, AB

Tamaru, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 5A期

关键词：

magneto-plasma-dynamic arc jet; plasma-flow-facing plate; chemical vapor deposition;

D O I：

10.1143/JJAP.35.2816

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron temperature and density of plasma flow, which vias obtained om a magneto-plasma-dynamic (MPD) are jet, were measured by the triple-probe method. In order to apply the MPD are jet io thin-film processing, the changes in the plasma parameters on a processing substrate were investigated.

引用

页码：2816 / 2817

页数：2

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