Effect of the hydrogen on the intrinsic stress in hydrogenated amorphous carbon films deposited from an electron cyclotron resonance plasma

The intrinsic stresses have been investigated in detail in particular diamondlike carbon films prepared by chemical vapor deposition assisted by electron cyclotron resonance plasma, as a function of the substrate bias and sample thickness in relation with the H content and bonding. Combined infrared absorption, elastic recoil detection analysis, and residual stress measurements are used to fully characterize the films in their as deposited state. The results indicate clearly that both the low and high biased samples exhibit compressive stresses. The stresses are found to be higher in the high biased films and are affected not only by the [H]/[C] ratio but also by the C-H and C-C volumetric distortions. [S0003-6951(98)04048-0]. (C) 1998 American Institute of Physics.