X-ray photoelectron spectroscopy study of the heating effects on Pd/6H-SiC Schottky structure

X-ray photoelectron spectroscopy is used to study the effects of heat treatment on the Pd/6H-SiC Schottky diode structure. After heating the structure at 425 degrees C for 140 h, a very thin surface layer of PdO mixed with SiOx formed on the palladium surface of the Schottky structure. Heat treatment promoted interfacial diffusion and reaction which significantly broadened the interfacial region. In the interfacial region, the palladium concentration decreases with depth, and the interfacial products are PdxSi (x = 1,2,3,4). In the high Pd concentration regions, Pd4Si is the major silicide component while PdSi and Pd,Si are major components in the low Pd concentration region. At the center of the interface, where the total palladium concentration equals that of silicon, the concentrations of palladium associated with various palladium silicides (PdxSi, x = 1,2,3,4) are approximately equal. The surface passivation layer composed of PdO and SiOx may significantly affect the electronic and catalytic properties of the surface of the Schottky diode which plays a major role in gas detection. The electronic properties of the Schottky structure may be dominated by a (Pd + PdxSi)/SiC interface. In order to stabilize the properties of the Schottky structure the surface and interface diffusion and reactions must be controlled. (C) 1998 American Vacuum Society. [S0734-2101(98)04205-5].