The effect of postdeposition annealing on chemical bonding in amorphous carbon nitride films prepared by dc magnetron sputtering

被引:13
作者
Jiang, LD [1 ]
Fitzgerald, AG [1 ]
Rose, MJ [1 ]
机构
[1] Univ Dundee, Dept Elect Engn & Phys, Carnegie Lab Phys, Dundee DD1 4HN, Scotland
关键词
carbon nitride; thermal annealing; XPS;
D O I
10.1016/S0169-4332(01)00427-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The effects of thermal annealing on the surface morphology, composition and chemical bond structure of amorphous carbon nitride (a-CN) films deposited by de magnetron sputtering are reported. Atomic force microscopy (AFM) results show that thermal annealing can gradually change the surface structure of the films from a cauliflower-like texture eventually to a uniform granular texture. Fourier transform infrared absorption (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) have been used to characterise. the change of chemical bonding induced by annealing. By detailed analysis of both C Is and N Is photoelectron spectra, we have found that annealing can break the C-N bonds in the films and that the graphite-like C-N bonds are relatively more stable with the increase of anneal temperature. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:331 / 338
页数:8
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