FIBSIM - dynamic Monte Carlo simulation of compositional and topography changes caused by focused ion beam milling

被引：27

作者：

Boxleitner, W ^{[1
]}

Hobler, G ^{[1
]}

机构：

[1] Vienna Univ Technol, Inst Festkorperelekt, A-1040 Vienna, Austria

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2001年 / 180卷

关键词：

focused ion beam; ion beam milling; sputtering; Monte Carlo simulation; topography simulation;

D O I：

10.1016/S0168-583X(01)00406-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A new simulation program is presented for focused ion beam (FIB) induced sputtering in two-dimensional targets. The model combines dynamic Monte Carlo simulation of the collision cascades with cell-based topography simulation. This approach takes the nonlocal nature of the sputtering process into account, and treats doping, damage formation and compositional changes self-consistently with the evolution of the surface. Two applications are presented: erosion of a sample edge, and milling of a hole into a multilayer target. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：125 / 129

页数：5

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