Accuracy and resolution limits of Kelvin probe force microscopy -: art. no. 125424

被引:343
作者
Zerweck, U [1 ]
Loppacher, C [1 ]
Otto, T [1 ]
Grafström, S [1 ]
Eng, LM [1 ]
机构
[1] Dresden Univ Technol, Inst Appl Photophys, D-01062 Dresden, Germany
关键词
D O I
10.1103/PhysRevB.71.125424
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Kelvin probe force microscopy is a scanning probe technique capable of mapping the local surface potential or work function on various surfaces with high spatial resolution. This technique can be realized on the basis of either an amplitude-sensitive method or a frequency-modulation method, which are sensitive to the electrostatic force and its gradient, respectively. We present a detailed experimental and theoretical study of the accuracy and resolution provided by the two methods, including the setup for the frequency-modulation technique. Au(111) with a submonolayer coverage of KCl serves as a test sample exhibiting extended sharply bounded areas that differ in work function by an amount well known from ultraviolet photoelectron spectroscopy. The influence of all relevant experimental parameters on the measurement is investigated. The experimental results are compared with the predictions of a numerical simulation based on a realistic model for the tip-sample geometry. Good agreement is found. The experimental analysis allows us to specify the lateral, vertical, and potential resolution that can be achieved with the two methods for a given tip size. Our work clearly proves that the frequency-modulation method is preferable in most applications because it (i) provides much higher lateral resolution, (ii) yields quantitative surface potential values on areas larger than the tip radius, and (iii) is little affected by variations of the tip-sample distance during topographic imaging.
引用
收藏
页数:9
相关论文
共 45 条
[1]   FREQUENCY-MODULATION DETECTION USING HIGH-Q CANTILEVERS FOR ENHANCED FORCE MICROSCOPE SENSITIVITY [J].
ALBRECHT, TR ;
GRUTTER, P ;
HORNE, D ;
RUGAR, D .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (02) :668-673
[2]  
[Anonymous], 1993, INTRO SCANNING TUNNE
[3]   ATOMIC FORCE MICROSCOPE [J].
BINNIG, G ;
QUATE, CF ;
GERBER, C .
PHYSICAL REVIEW LETTERS, 1986, 56 (09) :930-933
[4]  
BINNIG G, 1982, HELV PHYS ACTA, V55, P726
[5]   Resolution enhancement and improved data interpretation in electrostatic force microscopy -: art. no. 245403 [J].
Colchero, J ;
Gil, A ;
Baró, AM .
PHYSICAL REVIEW B, 2001, 64 (24)
[6]   Assessing the performance of two-dimensional dopant profiling techniques [J].
Duhayon, N ;
Eyber, P ;
Fouchier, M ;
Clarysee, T ;
Vandervorst, W ;
Alvarez, D ;
Schoemann, S ;
Ciappa, M ;
Stangoni, M ;
Fichtner, W ;
Formanek, P ;
Kittler, M ;
Raineri, V ;
Giannazzo, F ;
Goghero, D ;
Rosenwaks, Y ;
Shikler, R ;
Saraf, S ;
Sadewasser, S ;
Barreau, N ;
Glatzel, T ;
Verheijen, M ;
Mentink, SAM ;
von Sprekelsen, M ;
Maltezopoulos, T ;
Wiesendanger, R ;
Hellemans, L .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (01) :385-393
[7]   MAPPING OF SHORT-RANGE ADHESIVE FORCES BY SCANNING-TUNNELING-MICROSCOPY [J].
DURIG, U ;
ZUGER, O .
PHYSICAL REVIEW B, 1994, 50 (07) :5008-5011
[8]   Kelvin probe force microscopy of molecular surfaces [J].
Fujihira, M .
ANNUAL REVIEW OF MATERIALS SCIENCE, 1999, 29 :353-380
[9]  
GIESSIBL FJ, 1995, SCIENCE, V267, P1451
[10]   CuGaSe2 solar cell cross section studied by Kelvin probe force microscopy in ultrahigh vacuum [J].
Glatzel, T ;
Marrón, DF ;
Schedel-Niedrig, T ;
Sadewasser, S ;
Lux-Steiner, MC .
APPLIED PHYSICS LETTERS, 2002, 81 (11) :2017-2019