Synchronized swinging of electroluminescence intensity and peak wavelength with Si layer thickness in Au/SiO2/nanometer Si/SiO2/p-Si structures

被引:21
作者
Qin, GG [1 ]
Wang, YQ
Qiao, YP
Zhang, BR
Ma, ZC
Zong, WH
机构
[1] Peking Univ, Dept Phys, Beijing 100871, Peoples R China
[2] Acad Sinica, Int Ctr Mat Phys, Shenyang 110015, Peoples R China
[3] 13th Inst Minist Elect Ind, ShijiaZhuang 050051, Peoples R China
关键词
D O I
10.1063/1.123794
中图分类号
O59 [应用物理学];
学科分类号
摘要
SiO2/nanometer amorphous Si/SiO2 structures with Si layers of twelve different thicknesses in a range of 0-3.0 nm have been deposited with the two-target alternative magnetron sputtering technique. Electroluminescence (EL) from the Au/SiO2/nanometer amorphous Si/SiO2/p-Si structures has been observed. It is found that the EL peak intensity and peak wavelength synchronously swing with increasing Si layer thickness. The experimental results strongly indicate that the EL originates from luminescence centers in SiO2 layers rather than from the Si layers in the structures. The tunneling of electrons and holes and the quantum confinement effect for them in the nanometer Si layers play important roles in the EL. (C) 1999 American Institute of Physics. [S0003-6951(99)04315-6].
引用
收藏
页码:2182 / 2184
页数:3
相关论文
共 13 条
[1]   INTRINSIC MECHANISM FOR THE POOR LUMINESCENCE PROPERTIES OF QUANTUM-BOX SYSTEMS [J].
BENISTY, H ;
SOTOMAYORTORRES, CM ;
WEISBUCH, C .
PHYSICAL REVIEW B, 1991, 44 (19) :10945-10948
[2]   AMORPHOUS VISIBLE-LIGHT THIN-FILM LIGHT-EMITTING DIODE HAVING A-SIN-H AS A LUMINESCENT LAYER [J].
BOONKOSUM, W ;
KRUANGAM, D ;
PANYAKEOW, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (04) :1534-1538
[3]   SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].
CANHAM, LT .
APPLIED PHYSICS LETTERS, 1990, 57 (10) :1046-1048
[4]   OPTICAL-PROPERTIES OF SILICON-NITRIDE FILMS DEPOSITED BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION [J].
DESHPANDE, SV ;
GULARI, E ;
BROWN, SW ;
RAND, SC .
JOURNAL OF APPLIED PHYSICS, 1995, 77 (12) :6534-6541
[5]   ELECTROLUMINESCENCE STUDIES IN SILICON DIOXIDE FILMS CONTAINING TINY SILICON ISLANDS [J].
DIMARIA, DJ ;
KIRTLEY, JR ;
PAKULIS, EJ ;
DONG, DW ;
KUAN, TS ;
PESAVENTO, FL ;
THEIS, TN ;
CUTRO, JA ;
BRORSON, SD .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) :401-416
[6]   GROWTH OF GE MICROCRYSTALS IN SIO2 THIN-FILM MATRICES - A RAMAN AND ELECTRON-MICROSCOPIC STUDY [J].
FUJII, M ;
HAYASHI, S ;
YAMAMOTO, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (04) :687-694
[7]   Silicon-based visible light-emitting devices integrated into microelectronic circuits [J].
Hirschman, KD ;
Tsybeskov, L ;
Duttagupta, SP ;
Fauchet, PM .
NATURE, 1996, 384 (6607) :338-341
[8]   VISIBLE ELECTROLUMINESCENCE FROM POROUS SILICON [J].
KOSHIDA, N ;
KOYAMA, H .
APPLIED PHYSICS LETTERS, 1992, 60 (03) :347-349
[9]   VISIBLE ELECTROLUMINESCENCE FROM SEMITRANSPARENT AU FILM EXTRA THIN SI-RICH SILICON-OXIDE FILM P-SI STRUCTURE [J].
QIN, GG ;
LI, AP ;
ZHANG, BR ;
LI, BC .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (03) :2006-2009
[10]   A COMPARISON STUDY OF ELECTROLUMINESCENCE FROM AU NATIVE-OXIDE P-SI AND AU POROUS-SI DIODES [J].
QIN, GG ;
HUANG, YM ;
ZONG, BQ ;
ZHANG, LZ ;
ZHANG, BR .
SUPERLATTICES AND MICROSTRUCTURES, 1994, 16 (04) :387-390