Synthesis of P-type transparent conducting silver:indium oxide (AIO) thin films by reactive electron beam evaporation technique

被引:28
作者
Subrahmanyam, A [1 ]
Barik, UK [1 ]
机构
[1] Indian Inst Technol, Dept Phys, Semicond Phys Lab, Madras 600036, Tamil Nadu, India
关键词
indium doped silver oxide thin films; electrical properties and measurements; electron beam evaporation; transparent conducting oxide (TCO); work function;
D O I
10.1016/j.jpcs.2004.10.007
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Present paper reports the synthesis, electrical and optical properties of p-type conducting and transparent silver indium oxide (AIO) thin films prepared on glass substrates by reactive electron beam evaporation technique at three substrate temperatures (50, 200 and 250 degrees C) and at five evaporation rates (0.05 to 16.0 nm/s). The source material is pure powders of Ag2O:In2O3=50:50 mol%. The AIO films are amorphous. The films, though not corresponding to Delafossite crystal structure, exhibit p-type conductivity, when prepared at an evaporation rate of 0.05 nm/s at all the three substrate temperatures. With increasing filament current, it is observed that (i) the electrical resistivity decreases and (ii) the refractive index of the films (at 632.8 urn, and is in the range: 1.219-1.211) decreases. The work function (effective Fermi level) has been measured on these samples by Kelvin Probe method. The results are explained on the basis of partial ionic charge and localization of covalent bonds in the AIO thin films. (c) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:817 / 822
页数:6
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