An Anisotropic Etching Effect in the Graphene Basal Plane

被引:248
作者
Yang, Rong [1 ]
Zhang, Lianchang [1 ]
Wang, Yi [2 ]
Shi, Zhiwen [2 ]
Shi, Dongxia [1 ]
Gao, Hongjun [1 ]
Wang, Enge [2 ]
Zhang, Guangyu [1 ]
机构
[1] Chinese Acad Sci, Nanoscale Phys & Device Lab, Inst Phys, Beijing 100190, Peoples R China
[2] Chinese Acad Sci, Surface Phys Lab, Inst Phys, Beijing 100190, Peoples R China
基金
美国国家科学基金会;
关键词
SCANNING-TUNNELING-MICROSCOPY; ELECTRONIC-PROPERTIES; CARBON NANOTUBES; LAYER GRAPHENE; QUANTUM DOTS; NANORIBBONS; GRAPHITE; STABILITY; SIO2;
D O I
10.1002/adma.201000618
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A highly controllable, dry, anisotropic etching technique for graphene sheets has been achieved using hydrogen plasma etching. Zigzag edge formation was achieved by starting the etching at edges and defects and depends strongly on crystallographic orientation of the graphene. This dry, anisotropic etching approach combined with the standard lithographic technique is ideal for scalable graphene tailoring because the etching rates can be precisely controlled and the quality of the graphene can be preserved.
引用
收藏
页码:4014 / 4019
页数:6
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