On the nitrogen vacancy in GaN

被引:109
作者
Look, DC [1 ]
Farlow, GC
Drevinsky, PJ
Bliss, DF
Sizelove, JR
机构
[1] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[2] USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
[3] Wright State Univ, Dept Phys, Dayton, OH 45435 USA
[4] USAF, Res Lab, Sensors Directorate, Hanscom AFB, MA 01731 USA
关键词
D O I
10.1063/1.1623009
中图分类号
O59 [应用物理学];
学科分类号
摘要
The dominant electrically active defect produced by 0.42 MeV electron irradiation in GaN is a 70 meV donor. Since only N-sublattice displacements can be produced at this energy, and since theory predicts that the N interstitial is a deep acceptor in n-type GaN, we argue that the 70 meV donor is most likely the isolated N vacancy. The background shallow donors, in the 24-26 meV range, actually decrease in concentration, probably due to interactions with mobile N interstitials that are produced by the irradiation. Thus, the recent assignment of a photoluminescence (PL) line as an exciton bound to a 25 meV N-vacancy donor is incompatible with our results. Moreover, we do not observe that PL line in our sample. (C) 2003 American Institute of Physics.
引用
收藏
页码:3525 / 3527
页数:3
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