Wet-etched diffractive lenses for hard X-rays

被引：17

作者：

David, C ^{[1
]}

Ziegler, E

Nöhammer, B

机构：

[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland

[2] European Synchrotron Radiat Facil, F-38043 Grenoble, France

来源：

JOURNAL OF SYNCHROTRON RADIATION | 2001年 / 8卷 / 03期

关键词：

zone plates; hard X-rays; microfocusing;

D O I：

10.1107/S0909049501002746

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A method for the fabrication of linear transmission Fresnel zone plates for X-rays in the 8-15 keV photon energy range is presented. The diffractive elements are generated by electron-beam lithography and chemical wet etching of [110]-oriented silicon membrane substrates. Diffractive structures with aspect ratios of more than 30 for 300 nm-wide structures were obtained. The diffraction efficiency of such a lens was measured for 13.3 keV radiation to be 20%.

引用

页码：1054 / 1055

页数：2

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