Band engineering at interfaces: theory and numerical experiments

被引:255
作者
Peressi, M
Binggeli, N
Baldereschi, A
机构
[1] Univ Trieste, Dipartimento Fis Teor, Ist Nazl Fis Mat, I-34014 Trieste, Italy
[2] Ecole Polytech Fed Lausanne, Inst Phys Appl, CH-1015 Lausanne, Switzerland
关键词
D O I
10.1088/0022-3727/31/11/002
中图分类号
O59 [应用物理学];
学科分类号
摘要
Understanding the mechanisms which determine the band offsets and Schottky barriers at semiconductor contacts and engineering them for specific device applications are important theoretical and technological challenges. In this review, we present a theoretical approach to the band-line-up problem and discuss its application to prototypical systems. The emphasis is on ab initio computations and on theoretical models derived from first-principles numerical experiments. An approach based on linear-response-theory concepts allows a general description of the band alignment for various classes of semiconductor contacts and predicts the effects of various bulk and interfacial perturbations on the band discontinuities.
引用
收藏
页码:1273 / 1299
页数:27
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