Novel in situ production of smooth diamond films

被引：9

作者：

Gilbert, DR ^{[1
]}

Lee, DG ^{[1
]}

Singh, RK ^{[1
]}

机构：

[1] Univ Florida, Gainesville, FL 32611 USA

来源：

JOURNAL OF MATERIALS RESEARCH | 1998年 / 13卷 / 07期

关键词：

D O I：

10.1557/JMR.1998.0240

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have developed a unique method to produce smooth diamond films using a modified microwave plasma process system. This method consists of sequential in situ deposition and planarization in an electron cyclotron resonance plasma system. Diamond films were deposited to a thickness of 3.0 mu m in this system at a pressure of 1.000 Ton: from gas mixtures of methanol and hydrogen. Deposition was followed by planarization using a two-grid ion beam extraction process with a pure oxygen plasma at 10 mTorr, The average roughness of the diamond films so produced was as low as 30 nm, which was a factor of two lower than that of the as-deposited diamond films.

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页码：1735 / 1737

页数：3

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