Exploitation of atomic layer deposition for nanostructured materials

被引：60

作者：

Leskelae, Markku

Kemell, Marianna

Kukli, Kaupo

Pore, Viljami

Santala, Eero

Ritala, Mikko

Lu, Jun

机构：

[1] Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland

[2] Uppsala Univ, Dept Engn Sci, Angstrom Microstruct Lab, SE-75121 Uppsala, Sweden

来源：

MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS | 2007年 / 27卷 / 5-8期

基金：

芬兰科学院;

关键词：

ALD; nanomaterials; nanolaminates; nanofibers; nanotubes; porous materials; thin films;

D O I：

10.1016/j.msec.2006.06.006

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In making and modifying nanomaterials conformality is a prerequisite for the thin film deposition method. From its principle ALD is an ideal method for coating nanomaterials. In this paper the use of ALD for making nanostructured materials is exemplified by many ways: making of nanolaminates, deposition of thin films inside nanopores, as well as coating of nanofibers and nanorods. The materials deposited by ALD are mostly oxides, nitrides and metals. (C) 2006 Elsevier B.V. All rights reserved.

引用

收藏

页码：1504 / 1508

页数：5

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