Modified Thornton model for magnetron sputtered zinc oxide:: film structure and etching behaviour

被引:309
作者
Kluth, O [1 ]
Schöpe, G [1 ]
Hüpkes, J [1 ]
Agashe, C [1 ]
Müller, J [1 ]
Rech, B [1 ]
机构
[1] Forschungszentrum Julich, Inst Photovoltaics, D-52425 Julich, Germany
关键词
etching; sputtering; surface morphology; zinc oxide;
D O I
10.1016/S0040-6090(03)00949-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZnO:Al films were prepared on glass substrates with different sputter techniques from ceramic ZnO:Al(2)O(3) target as well as metallic Zn:Al targets using a wide range of deposition parameters. Independent of the sputter technique, sputter pressure and substrate temperature were found to have a major influence on the electrical and structural properties of the ZnO:Al films. With an increasing deposition pressure, we observed a strong decrease in the carrier mobility and also an increase of the etching rate. The surface morphology obtAlned after etching of RF sputtered ZnO:Al systematically changes from crater-like to hill-like surface appearance with increasing pressure. The correlation of sputter parameters, film growth and structural properties is discussed in terms of a modified Thornton model. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:80 / 85
页数:6
相关论文
共 17 条
  • [11] The physical properties of Al-doped zinc oxide films prepared by RF magnetron sputtering
    Park, KC
    Ma, DY
    Kim, KH
    [J]. THIN SOLID FILMS, 1997, 305 (1-2) : 201 - 209
  • [12] Pulker H. K., 1999, COATINGS GLASS
  • [13] Electronic properties of Cu(In,Ga)Se2 heterojunction solar cells-recent achievements, current understanding, and future challenges
    Rau, U
    Schock, HW
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (02): : 131 - 147
  • [14] Potential of amorphous silicon for solar cells
    Rech, B
    Wagner, H
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (02): : 155 - 167
  • [15] SELVAN JA, 1999, THESIS U NAEUCHATEL, V361
  • [16] HIGH-RATE THICK-FILM GROWTH
    THORNTON, JA
    [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1977, 7 : 239 - 260
  • [17] INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS
    THORNTON, JA
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 666 - 670