SiGeC: Band gaps, band offsets, optical properties, and potential applications

被引:21
作者
Brunner, K
Schmidt, OG
Winter, W
Eberl, K
Gluck, M
Konig, U
机构
[1] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
[2] Daimler Benz AG, Res Ctr, D-89081 Ulm, Germany
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 03期
关键词
D O I
10.1116/1.590038
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Studying the structural and photoluminescence properties of pseudomorphic Si1-yCy and Si1-x-yGexCy multiple quantum well (QW) structures on (001) Si substrates offer a quantitative characterization of the band gap and band offset shifts caused by C alloying for y < 3%. The main features of Si1-yCy alloys, which are a reduced lattice constant and a strong lowering of the conduction band energy, promise that C may serve as a counterpart to Ge in Si heteroepitaxy. The photoluminescent properties of Si1-yCy and SiGeC QWs are comparable to SiGe. Novel pseudomorphic Si1-yCy/SiGe coupled QW structures and Si1-yCy/Ge quantum dot structures result in a strong enhancement of the photoluminescent efficiency. The ternary SiGeC material system offers a higher degree of freedom in strain and band edge,engineering of structures. We focus on our recent results on Si1-yCy and SiGeC QW layers embedded in Si concerning the growth by solid-source molecular beam epitaxy, structural properties, thermal stability, optical properties, and band offsets. The prospects of SiGeC alloys for realization of,optoelectronic structures are discussed. First characteristics from 0.75 mu m p-channel modulation-doped field-effect transistor devices containing an active SiGeC layer demonstrate good electrical properties. (C) 1998 American Vacuum Society.
引用
收藏
页码:1701 / 1706
页数:6
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