Temperature and applied voltage dependence of magnetoresistance ratio in Fe Al oxide Fe junctions

被引:14
作者
Tezuka, N [1 ]
Miyazaki, T [1 ]
机构
[1] Tohoku Univ, Fac Engn, Dept Appl Phys, Sendai, Miyagi 98077, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1998年 / 37卷 / 2B期
关键词
tunnel magnetoresistance effect; temperature and applied voltage dependence; Fe; Al oxide; zero bias anomaly;
D O I
10.1143/JJAP.37.L218
中图分类号
O59 [应用物理学];
学科分类号
摘要
The tunnel magnetoresistance(TMR) ratio have been investigated in the Fe/Al oxide/Fe junctions, specifically the temperature and applied voltage dependence of the TMR ratio. It was found that the dependence of resistance at saturation magnetization state (R-s) on the applied voltage at 4.2 K is completely anomalous in terms of the expected tunneling behavior. This "zero-bias anomaly" is due to the magnetic impurity in or near the boundary between ferromagnetic electrodes and insulator. The TMR ratio decreased rapidly with increasing temperature. The TMR ratio also decreased when increasing the applied voltage. We discussed the dependence of the TMR ratio on temperature acid applied voltage taking into account the impurity assisted tunneling.
引用
收藏
页码:L218 / L220
页数:3
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