Synchrotron radiation excited etching of diamond

We have succeeded in synchrotron radiation (SR) excited etching of crystalline diamond. It proceeds even at low temperatures at which diamond is thermally not oxidized in the gaseous environment. It has been demonstrated that any of the three types of crystalline diamond, i.e., industrial diamond made at high pressures, thin films grown by chemical vapor deposition, and natural diamond, can be etched by irradiating SR in the O-2 atmosphere. From the etched pattern obtained by placing a Ni mesh made of 40 mu m wires above the sample, it has been concluded that only the irradiated area is etched and thus surface excitation by SR is essential along with the supply of reactive radical species formed by photodissociation. (C) 1996 American Institute of Physics.