Molecular-beam epitaxy of beryllium-chalcogenide-based thin films and quantum-well structures

被引:200
作者
Waag, A
Fischer, F
Lugauer, HJ
Litz, T
Laubender, J
Lunz, U
Zehnder, U
Ossau, W
Gerhardt, T
Moller, M
Landwehr, G
机构
[1] Physikalisches Institut, Universität Würzburg
关键词
D O I
10.1063/1.362888
中图分类号
O59 [应用物理学];
学科分类号
摘要
A variety of BeMgZnSe-ZnSe- as well as BeTe-based quantum-well structures has been fabricated and investigated. BeTe buffer layers improve the growth start on GaAs substrates drastically compared to ZnSe/GaAs. The valence-band offset between BeTe and ZnSe has been determined to be 0.9 eV (type II). Due to the high-lying valence band of BeTe, a BeTe-ZnSe pseudograding can be used for an efficient electrical contact between p-ZnSe and p-GaAs. BeMgZnSe quaternary thin-film structures have reproducibly been grown with high structural quality, and rocking curve widths below 20 arcsec could be reached. Quantum-well structures show a high photoluminescence intensity even at room temperature. (C) 1996 American Institute of Physics.
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收藏
页码:792 / 796
页数:5
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