Microstructure and mechanical/thermal properties of Cr-N coatings deposited by reactive unbalanced magnetron sputtering

被引:223
作者
Mayrhofer, PH [1 ]
Tischler, G [1 ]
Mitterer, C [1 ]
机构
[1] Univ Min & Met Leoben, Dept Phys Met & Mat Testing, A-8700 Leoben, Austria
关键词
CrN coating; stress measurement; hardness; Hall-Petch;
D O I
10.1016/S0257-8972(01)01090-8
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Chromium nitride (CrN) is a hard material and a well-established coating for applications where severe corrosion and friction conditions are present. In this work, we report on the influence of nitrogen/argon flow rate ratio, ion energy and ion/atom flux ratio on the microstructure, hardness, residual stresses and thermal stability of magnetron sputtered chromium nitride coatings. The coatings were characterized with respect to thickness, morphology, chemical composition, microstructure and hardness. Hardness values up to 38.4 GPa could be obtained for stoichiometric CrN, which strongly depend on the grain size and residual stress. Thermal coating properties were evaluated using stress measurements during thermal cycling and XRD analyses after annealing at 500 and 700 degrees C. Film stresses up to 700 degreesC were measured from the bending of coated silicon specimens using the Stoney formula. Stress relaxation occurring during this temperature treatment strongly depends on the biaxial stresses in the as-deposited state. The interrelationships between growth conditions, microstructure, mechanical and thermal properties will be presented and discussed. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:78 / 84
页数:7
相关论文
共 27 条
[1]   EFFECTS OF HIGH-FLUX LOW-ENERGY (20-100 EV) ION IRRADIATION DURING DEPOSITION ON THE MICROSTRUCTURE AND PREFERRED ORIENTATION OF TI0.5AL0.5N ALLOYS GROWN BY ULTRA-HIGH-VACUUM REACTIVE MAGNETRON SPUTTERING [J].
ADIBI, F ;
PETROV, I ;
GREENE, JE ;
HULTMAN, L ;
SUNDGREN, JE .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (12) :8580-8589
[2]   Microstructural evolution during tempering of arc-evaporated Cr-N coatings [J].
Almer, J ;
Odén, M ;
Hultman, L ;
Håkansson, G .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (01) :121-130
[3]   EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J].
BLAND, RD ;
KOMINIAK, GJ ;
MATTOX, DM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :671-674
[4]   CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J].
BRENNER, A ;
SENDEROFF, S .
JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02) :105-123
[5]   USE OF THE VOIGT FUNCTION IN A SINGLE-LINE METHOD FOR THE ANALYSIS OF X-RAY-DIFFRACTION LINE BROADENING [J].
DEKEIJSER, TH ;
LANGFORD, JI ;
MITTEMEIJER, EJ ;
VOGELS, ABP .
JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1982, 15 (JUN) :308-314
[6]  
EBERT H, 1971, LANDOLTBORNSTEIN EIG, P402
[7]   Structure, hardness, and tribological properties of reactive magnetron sputtered chromium nitride films [J].
He, XM ;
Baker, N ;
Kehler, BA ;
Walter, KC ;
Nastasi, M ;
Nakamura, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (01) :30-36
[8]   Influence of ion bombardment on structure and properties of unbalanced magnetron grown CrNx coatings [J].
Hurkmans, T ;
Lewis, DB ;
Paritong, H ;
Brooks, JS ;
Münz, WD .
SURFACE & COATINGS TECHNOLOGY, 1999, 114 (01) :52-59
[9]   Chromium nitride coatings grown by unbalanced magnetron (UBM) and combined arc/unbalanced magnetron (ABS(TM)) deposition techniques [J].
Hurkmans, T ;
Lewis, DB ;
Brooks, JS ;
Munz, WD .
SURFACE & COATINGS TECHNOLOGY, 1996, 86 (1-3) :192-199
[10]   INFLUENCE OF AN EXTERNAL AXIAL MAGNETIC-FIELD ON THE PLASMA CHARACTERISTICS AND DEPOSITION CONDITIONS DURING DIRECT-CURRENT PLANAR MAGNETRON SPUTTERING [J].
IVANOV, I ;
KAZANSKY, P ;
HULTMAN, L ;
PETROV, I ;
SUNDGREN, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (02) :314-320