Electronic structure analysis of α-SiO2 via x-ray absorption near-edge structure at the Si K, L2,3 and O K edges

被引:65
作者
Wu, ZY
Jollet, F
Seifert, F
机构
[1] CE Saclay, DSM, Commiss Energie Atom, SRSIM,DRECAM, F-91191 Gif Sur Yvette, France
[2] Ist Nazl Fis Nucl, Lab Nazl Frascati, I-00044 Frascati, Italy
[3] Univ Bayreuth, Bayer Geoinst, D-95440 Bayreuth, Germany
关键词
D O I
10.1088/0953-8984/10/36/016
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The electronic structure of empty states in quartz (alpha-SiO2) has been investigated by calculating the individual contributions of Si 1s, 2p and O 1s to the x-ray absorption near-edge structure (XANES) spectra; excellent agreement has been found between the experimental data and full multiple-scattering calculations. On the basis of the comparison, the origins of the spectral transition features can be assigned unambiguously. Although symmetry-based molecular-orbital theory is qualitatively adequate for describing these spectra, the interpretation of the Si K-edge XANES spectrum exclusively in terms of a ground-stale potential is inappropriate in general.
引用
收藏
页码:8083 / 8092
页数:10
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