Rapid prototyping of 2D structures with feature sizes larger than 8 μm

被引：34

作者：

Linder, V ^{[1
]}

Wu, HK ^{[1
]}

Jiang, XY ^{[1
]}

Whitesides, GM ^{[1
]}

机构：

[1] Harvard Univ, Dept Chem & Biol Chem, Cambridge, MA 02138 USA

来源：

ANALYTICAL CHEMISTRY | 2003年 / 75卷 / 10期

关键词：

D O I：

10.1021/ac026441d

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

This paper extends rapid prototyping for several types of lithography to the 8-25-mum size range, using transparency photomasks prepared by photoplotting. It discusses the technical improvement in photomask quality achieved by photoplotting, compared to the currently used image setting, and demonstrates differences in the resolution that can be obtained with photomasks with features in the 8-100-mum size range. These high-resolution photomasks were used to microfabricate microelectrodes, micro-lenses, and stamps for microcontact printing, following methods described previously.

引用

页码：2522 / 2527

页数：6

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