Using patterns in microfiche as photomasks in 10-μm-scale microfabrication

被引：31

作者：

Deng, T ^{[1
]}

Tien, J ^{[1
]}

Xu, B ^{[1
]}

Whitesides, GM ^{[1
]}

机构：

[1] Harvard Univ, Dept Chem & Biol Chem, Cambridge, MA 02138 USA

来源：

LANGMUIR | 1999年 / 15卷 / 19期

关键词：

D O I：

10.1021/la990372p

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Microfiche has been used as the photomask in 1:1 contact photolithography to generate structures of photoresist with features as small as 10 mu m. Optical reduction of images that were printed by a high-resolution image setter on transparent polymer sheets generated patterns in microfiche. The photoresist patterns generated using microfiche as the photomask are useful in the fabrication of elastomeric stamps/molds/membranes for soft lithography. Four test structures fabricated using microfiche as photomask and soft lithography are used to evaluate the utility and resolution of this technique.

引用

页码：6575 / 6581

页数：7

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