Rapid prototyping of complex structures with feature sizes larger than 20 mu m

被引：203

作者：

Qin, D ^{[1
]}

Xia, YN ^{[1
]}

Whitesides, GM ^{[1
]}

机构：

[1] HARVARD UNIV,DEPT CHEM,CAMBRIDGE,MA 02138

来源：

ADVANCED MATERIALS | 1996年 / 8卷 / 11期

关键词：

D O I：

10.1002/adma.19960081110

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A rapid, low-cost technique of microfabrication for feature sizes of 20 mu m or more is described, which is useful for the rapid production of limited numbers of microsensor and optical structures The pattern can be designed on a PC and printed out on transparent films of polymers using a commercial image-setting system. The Figure shows an SEM image of a relief pattern generated on photoresistant film using this method.

引用

页码：917 / &

页数：4

共 27 条

[1]

AKSAY IA, 1996, SPIE, V2716, P280

[2]

[Anonymous], THIN FILM PROCESSES

[3] MICROPATTERNING OF SURFACES BY EXCIMER LASER PROJECTION [J].