Poly(N-alkylmethacrylamide) LB films with short-branched alkyl side chains for a self-developed positive photoresist

被引:23
作者
Guo, YZ [1 ]
Mitsuishi, M [1 ]
Miyashita, T [1 ]
机构
[1] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, Sendai, Miyagi 9808577, Japan
关键词
D O I
10.1021/ma0008591
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
An ultrathin film of poly(N-neopentylmethacrylamide) (PnPMA) prepared by the Langmuir-Blodgett technique was examined as a high-resolution self-developed photoresist. The properties of the LB films were investigated using W absorption spectra and X-ray diffraction. Fine lines and spaces with positive-tone patterns on the LB film were achieved solely by deep W irradiation (self-development). A fine gold pattern with a resolution of 1.5 mum was obtained by etching patterned LB film on gold film deposited on a glass substrate, indicating that 20 layers of LB film (about 20 nm) is stable against wet etching.
引用
收藏
页码:3548 / 3551
页数:4
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