Soft lithography

被引:5360
作者
Xia, YN [1 ]
Whitesides, GM [1 ]
机构
[1] Harvard Univ, Dept Chem & Chem Biol, Cambridge, MA 02138 USA
来源
ANNUAL REVIEW OF MATERIALS SCIENCE | 1998年 / 28卷
关键词
patterning; microfabrication; nanofabrication; elastomers; self-assembled monolayers;
D O I
10.1146/annurev.matsci.28.1.153
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Soft lithography represents a non-photolithographic strategy based on self-assembly and replica molding for carrying out micro- and nanofabrication. It provides a convenient, effective, and low-cost method for the formation and manufacturing of micro- and nanostructures. In soft lithography, an elastomeric stamp with patterned relief structures on its surface is used to generate patterns and structures with feature sizes ranging from 30 nm to 100 mu m. Five techniques have been demonstrated: microcontact printing (mu CP), replica molding (REM), microtransfer molding (mu TM), micromolding in capillaries (MIMIC), and solvent-assisted micromolding (SAMIM). In this chapter we discuss the procedures for these techniques and their applications in micro- and nanofabrication, surface chemistry, materials science, optics, MEMS, and microelectronics.
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页码:153 / 184
页数:32
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