Electronic structure of the Si-rich 3C-SiC(001)3x2 surface

被引:44
作者
Yeom, HW [1 ]
Chao, YC
Matsuda, I
Hara, S
Yoshida, S
Uhrberg, RIG
机构
[1] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
[2] Univ Tokyo, Res Ctr Spectrochem, Tokyo 113, Japan
[3] Univ Tokyo, Dept Chem, Tokyo 113, Japan
[4] Electrotech Lab, Ibaraki 305, Japan
关键词
D O I
10.1103/PhysRevB.58.10540
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electronic structure of the Si-rich 3C-SiC(001) surface with a single-domain 3 x 2 long-range order has been studied by angle-resolved photoemission using synchrotron radiation. By identifying the topmost bulk valence band the Fermi level position at the surface is accurately determined to be located at 2.1 eV above the valence-band maximum. Four different surface state bands are clearly identified within the bulk band gap at 1.4 +/- 0.1, 2.3 +/- 0.1, 2.9 +/- 0.1, and 3.8 +/- 0.1 eV below the Fermi level, respectively. These states show no dispersion with photon energy in normal emission and both hydrogen adsorption and Si sublimation make them disappear. Dispersions and symmetry properties of the surface states were determined in detail. All four surface state bands have unusually small dispersions throughout the surface Brillouin zone suggesting strong localization of the electron orbitals within a unit cell and a unique surface bond configuration. The origins of the surface states observed in this study are ascribed to the dangling bonds of both the Si ad-dimers and the second layer Si atoms in the 3x2 surface reconstruction. [S0163-1829(98)04136-8].
引用
收藏
页码:10540 / 10550
页数:11
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