Instability of gold oxide Au2O3

被引：155

作者：

Tsai, HC

Hu, E

Perng, K

Chen, MK

Wu, JC

Chang, YS

机构：

[1] Global Commun Technol Corp, Hsinchu 30077, Taiwan

[2] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan

来源：

SURFACE SCIENCE | 2003年 / 537卷 / 1-3期

关键词：

gold; plasma processing; X-ray photoelectron spectroscopy; oxygen;

D O I：

10.1016/S0039-6028(03)00640-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The kinetics of the dissociation of gold oxide, Au2O3, formed by O-2-plasma treatment of An film were examined by X-ray photoelectron spectroscopy (XPS) and by taking electrical resistance measurements. The surface resistance of the gold film was markedly increased by O-2-plasma treatment and then gradually returned to the initial value in air at room temperature (22 degreesC). XPS indicated that Au2O3 can be formed by O-2-plasma treatment and spontaneously dissociated to gold elements. The time dependence of the dissociation of Au2O3 was also analyzed by monitoring the surface resistance and applying a first-order rate equation at temperatures between 22 and 100 degreesC the activation energy was calculated to be 57 kJ/mol. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：L447 / L450

页数：4

共 11 条

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