Formation of a rectangular poly(methyl methacrylate) micropattern onto a polystyrene brush with use of ATRP and electron beam irradiation

被引：19

作者：

Maeng, IS ^{[1
]}

Park, JW ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol, Ctr Integrated Mol Syst, Dept Chem, Div Mol & Life Sci, Pohang 790784, South Korea

来源：

LANGMUIR | 2003年 / 19卷 / 23期

关键词：

D O I：

10.1021/la034898s

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：9973 / 9976

页数：4

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