The Effect of Solvent on the Phase of Titanium Dioxide Deposited by Aerosol-assisted CVD

被引：32

作者：

Edusi, Cynthia ^{[1
]}

Sankar, Gopinathan ^{[1
]}

Parkin, Ivan P. ^{[1
]}

机构：

[1] UCL, Mat Chem Res Ctr, Dept Chem, London WC1J OAJ, England

来源：

CHEMICAL VAPOR DEPOSITION | 2012年 / 18卷 / 4-6期

基金：

英国工程与自然科学研究理事会;

关键词：

AACVD; Photocatalyst; Solvent effects; Titanium dioxide; Water contact angles; TIO2; FILMS; ANATASE;

D O I：

10.1002/cvde.201106961

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Titanium (IV) isopropoxide (TTIP) in methanol, ethanol, hexane, dichloromethane, and isopropanol solvents is used to deposit titanium dioxide thin films on glass and steel substrates at 550?degrees C using aerosol-assisted (AA)CVD. X-ray diffraction (XRD), and Raman spectra of the as-deposited films show that using methanol as the carrier solvent produces exclusively rutile films on steel, and predominantly rutile on glass substrates, while the use of the other solvents produces exclusively anatase phase on the steel under the same conditions. TiO2 is also deposited by AACVD from a mixture of ethanol and methanol solvents. As little as 15% of methanol in ethanol produces rutile as the predominant phase. Using a dye-ink test, the titanium dioxide thin films produced with ethanol are shown to be more active photocatalysts than films produced with methanol. All the films show photo-induced superhydrophilicity but, surprisingly, films stored in the dark have a water contact angle above 100 degrees.

引用

页码：126 / 132

页数：7

共 22 条

[1] Novel multifunctional films [J].

Brook, L. A. ;

Evans, P. ;

Foster, H. A. ;

Pemble, M. E. ;

Sheel, D. W. ;

Steele, A. ;

Yates, H. M. .

SURFACE & COATINGS TECHNOLOGY, 2007, 201 (22-23) :9373-9377

[2] Library of FT-Raman spectra of pigments, minerals, pigment media and varnishes, and supplement to existing library of Raman spectra of pigments with visible excitation [J].

Burgio, L ;

Clark, RJH .

SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY, 2001, 57 (07) :1491-1521

[3] Preparation and Characterisation of Super-Hydrophobic Surfaces [J].

Crick, Colin R. ;

Parkin, Ivan P. .

CHEMISTRY-A EUROPEAN JOURNAL, 2010, 16 (12) :3568-3588

[4] Aerosol-Assisted CVD of Titanium Dioxide Thin Films from Methanolic Solutions of Titanium Tetraisopropoxide; Substrate and Aerosol-Selective Deposition of Rutile or Anatase [J].

Edusi, Cynthia ;

Hyett, Geoffrey ;

Sankar, Gopinathan ;

Parkin, Ivan P. .

CHEMICAL VAPOR DEPOSITION, 2011, 17 (1-3) :30-36

[5] Precursor-directed control of crystalline type in atmospheric pressure CVD growth of TiO2 on stainless steel [J].

Evans, Philip ;

Pemble, Martyn E. ;

Sheel, David W. .

CHEMISTRY OF MATERIALS, 2006, 18 (24) :5750-5755

[6]

HITCHMAN ML, 1999, J PHYS IV, V9, P8

[7] Processing and applications of aerosol-assisted chemical vapor deposition [J].

Hou, Xianghui ;

Choy, Kwang-Leong .

CHEMICAL VAPOR DEPOSITION, 2006, 12 (10) :583-596

[8] Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction [J].

Hyett, Geoffrey ;

Darr, Jawwad A. ;

Mills, Andrew ;

Parkin, Ivan P. .

CHEMICAL VAPOR DEPOSITION, 2010, 16 (10-12) :301-304

[9] Methanol decomposition over copper/silica: effect of temperature and co-reactant on carbon deposition [J].

Jackson, SD ;

Anderson, DS ;

Kelly, GJ ;

Lear, T ;

Lennon, D ;

Watson, SR .

TOPICS IN CATALYSIS, 2003, 22 (3-4) :173-182

[10] HIGHLY EFFICIENT SEMICONDUCTING TIO2 PHOTOELECTRODES PREPARED BY AEROSOL PYROLYSIS [J].

KAVAN, L ;

GRATZEL, M .

ELECTROCHIMICA ACTA, 1995, 40 (05) :643-652

← 1 2 3 →