Pulsed laser deposition of Bi2Te3 thin films

被引:86
作者
Dauscher, A
Thomy, A
Scherrer, H
机构
[1] Lab. Metall. Phys. et Sci. des Mat., URA 155 du CNRS, Ecole des Mines de Nancy, F-54042 Nancy Cedex, Parc de Saurupt
关键词
laser ablation; surface composition; tellurium; X-ray diffraction;
D O I
10.1016/0040-6090(95)08221-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A feasibility study of thin stoichiometric Bi2Te3 films by pulsed laser deposition (PLD) was performed, the difficulty arising from the differences of vapour pressure between Te and Bi. The films were elaborated using a pulsed Nd:YAG laser under various experimental conditions and were characterized by electron microprobe, scanning electron microscopy, X-ray diffraction and secondary ion mass spectroscopy analyses. Congruent transfer of stoichiometry occurs from the target to the substrate on several cm(2) and a good crystallinity can be achieved, even on glass substrates at room temperature, by combining convenient target to substrate facing and distance, respectively. Depletion in Te observed in some films may result from a laser beam-plume interaction that was put forward during elaboration of films on large scale substrates.
引用
收藏
页码:61 / 66
页数:6
相关论文
共 20 条