High-resolution X-ray diffraction and optical absorption study of heavily nitrogen-doped 4H-SiC crystals

被引:20
作者
Chung, HJ [1 ]
Skowronski, M [1 ]
机构
[1] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA
基金
美国国家科学基金会;
关键词
doping; high resolution X-ray diffraction; semiconducting materials;
D O I
10.1016/S0022-0248(03)01584-7
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Lattice parameter and optical absorption spectra were measured on heavily nitrogen-doped bulk crystals and epilayers of 4H-SiC. The rate of c-lattice parameter change versus doping concentration in high quality material was less than -3.6 x 10(-25) Angstrom cm(3). In crystals containing high density of double stacking faults, the (0 0 0 8) X-ray reflection shifted toward the (2 2 2) reflection in 3C SiC. Optical absorption measurements in such crystals detected peak at 3.1 eV similar to that reported in 3C-SiC with concomitant decrease of free carrier peak characteristic of 4H-SiC polytype. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:52 / 60
页数:9
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