Effect of Sb as a surfactant during the lateral epitaxial overgrowth of GaN by metalorganic vapor phase epitaxy

被引:36
作者
Zhang, L [1 ]
Tang, HF [1 ]
Kuech, TF [1 ]
机构
[1] Univ Wisconsin, Dept Chem Engn, Madison, WI 53706 USA
关键词
D O I
10.1063/1.1415774
中图分类号
O59 [应用物理学];
学科分类号
摘要
Antimony (Sb), an isoelectronic impurity, has been studied as a surfactant during the lateral epitaxial overgrowth (LEO) of gallium nitride (GaN) by metalorganic vapor phase epitaxy (MOVPE). The presence of Sb in the gas phase was found to alter both the LEO growth rates and the predominant facet formations. Vertical facets to the LEO growth appear with the addition of Sb under conditions that normally produce triangular or sloped sidewalls over a range of growth temperatures. While Sb alters the growth facets, only a small amount of Sb was incorporated into the GaN, suggesting that Sb acts as a surfactant during the GaN MOVPE growth. Sb addition produces surface conditions characteristic of a Ga-rich surface stoichiometry indicating both a possible change in the reactivity of NH3 and/or enhanced surface diffusion of Ga adatom species. (C) 2001 American Institute of Physics.
引用
收藏
页码:3059 / 3061
页数:3
相关论文
共 15 条
[1]   Magnesium induced changes in the selective growth of GaN by metalorganic vapor phase epitaxy [J].
Beaumont, B ;
Haffouz, S ;
Gibart, P .
APPLIED PHYSICS LETTERS, 1998, 72 (08) :921-923
[2]   SURFACTANTS IN EPITAXIAL-GROWTH [J].
COPEL, M ;
REUTER, MC ;
KAXIRAS, E ;
TROMP, RM .
PHYSICAL REVIEW LETTERS, 1989, 63 (06) :632-635
[3]   INFLUENCE OF SURFACTANTS IN GE AND SI EPITAXY ON SI(001) [J].
COPEL, M ;
REUTER, MC ;
VONHOEGEN, MH ;
TROMP, RM .
PHYSICAL REVIEW B, 1990, 42 (18) :11682-11689
[4]   High-quality coalescence of laterally overgrown GaN stripes on GaN/sapphire seed layers [J].
Fini, P ;
Zhao, L ;
Moran, B ;
Hansen, M ;
Marchand, H ;
Ibbetson, JP ;
DenBaars, SP ;
Mishra, UK ;
Speck, JS .
APPLIED PHYSICS LETTERS, 1999, 75 (12) :1706-1708
[5]  
Hiramatsu K, 1998, MATER RES SOC SYMP P, V482, P257
[6]   SURFACTANT-MEDIATED CRYSTAL-GROWTH OF SEMICONDUCTORS [J].
KANDEL, D ;
KAXIRAS, E .
PHYSICAL REVIEW LETTERS, 1995, 75 (14) :2742-2745
[7]   Surfactant controlled growth of GaInP by organometallic vapor phase epitaxy [J].
Lee, RT ;
Shurtleff, JK ;
Fetzer, CM ;
Stringfellow, GB ;
Lee, S ;
Seong, TY .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (08) :3730-3735
[8]   Mechanisms of lateral epitaxial overgrowth of gallium nitride by metalorganic chemical vapor deposition [J].
Marchand, H ;
Ibbetson, JP ;
Fini, PT ;
Keller, S ;
DenBaars, SP ;
Speck, JS ;
Mishra, UK .
JOURNAL OF CRYSTAL GROWTH, 1998, 195 (1-4) :328-332
[9]   Kinetics of nucleation in surfactant-mediated epitaxy [J].
Markov, I .
PHYSICAL REVIEW B, 1996, 53 (07) :4148-4155
[10]   SURFACTANT MEDIATED EPITAXIAL-GROWTH OF INXGA1-XAS ON GAAS (001) [J].
MASSIES, J ;
GRANDJEAN, N ;
ETGENS, VH .
APPLIED PHYSICS LETTERS, 1992, 61 (01) :99-101