Investigations on the crystallisation properties of RF magnetron sputtered indium tin oxide thin films

被引：98

作者：

Thilakan, P ^{[1
]}

Minarini, C ^{[1
]}

Loreti, S ^{[1
]}

Terzini, E ^{[1
]}

机构：

[1] ENEA, Ctr Ric, I-80055 Portici, NA, Italy

来源：

THIN SOLID FILMS | 2001年 / 388卷 / 1-2期

关键词：

indium tin oxide; thin film deposition; RF magnetron sputtering; crystal growth; X-ray diffraction; X-ray texture; characterization;

D O I：

10.1016/S0040-6090(01)00820-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

X-Ray diffraction and X-ray texture analysis have been carried out on RF magnetron sputtered ITO (indium tin oxide) thin films on glass substrates in order to understand their crystal growth behaviour. Films deposited at various deposition rates and gas compositions were subjected to investigation. X-Ra; diffraction analysis revealed the polycrystalline structure of the films with a difference in crystallographic orientation without any change in the BCC (Body Centred Cubic) structure. Both the increase in deposition rate and gas composition reflects the change in crystallographic orientation. X-Ray texture analysis on the grown films revealed also a difference in film texturization following the change in crystallographic orientation. Strong orientation of crystallites perpendicular to the substrate were observed for films grown with (400) preferential plane. (C) 2001 Elsevier Science B.V. Ail rights reserved.

引用

页码：34 / 40

页数：7

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