A comparative study of single-electron memories

被引:41
作者
Wasshuber, C [1 ]
Kosina, H [1 ]
Selberherr, S [1 ]
机构
[1] Vienna Univ Technol, Inst Microelect, A-1040 Vienna, Austria
关键词
Coulomb blockade; memory; quantum dot; single-electron; tunneling;
D O I
10.1109/16.726659
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We study different memory cell designs and compare their advantages and disadvantages from an engineering point of view. We look at operational stability as a function of temperature and stray charge (random background charge), and discuss the issue of reliable mass production. We conclude that memories seem to be one of the most promising large scale single-electron tunnel applications, that lie, particularly when granular films are used, already in the range of today's process technology.
引用
收藏
页码:2365 / 2371
页数:7
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