Supersaturated carbon in silicon and silicon/germanium alloys

被引:19
作者
Osten, HJ
机构
[1] Institute of Semiconductor Physics, D-15204 Frankfurt(O)
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1996年 / 36卷 / 1-3期
关键词
supersaturation; carbon; silicon; alloys;
D O I
10.1016/0921-5107(95)01272-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The growth and properties of Si1-yCy and Si1-x-yGexCy alloys pseudomorphically strained on Si(001) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers of more than 1 at.%C can be fabricated. Most of the incorporated C atoms occupy substitutional positions and, therefore, allow strain manipulation; including the growth of an inversely strained Si1-x-yGexCy layer. The mechanical properties as well as the influence of C atoms on band structure will be discussed. Finally we will present an atomistic picture of a fully strain-compensated SiGeC layer.
引用
收藏
页码:268 / 274
页数:7
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