Non-linear processes in the gas cluster ion beam modification of solid surfaces

被引：63

作者：

Yamada, I ^{[1
]}

Matsuo, J ^{[1
]}

Toyoda, N ^{[1
]}

Aoki, T ^{[1
]}

Jones, E ^{[1
]}

Insepov, Z ^{[1
]}

机构：

[1] Kyoto Univ, Ion Beam Engn Expt Lab, Sakyo Ku, Kyoto 606, Japan

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1998年 / 253卷 / 1-2期

关键词：

cluster ion beam; shallow ion implantation; sputtering; surface smoothing; cluster ion-assisted thin film deposition;

D O I：

10.1016/S0921-5093(98)00733-3

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of hundreds to thousands of atoms have been generated from various kinds of gas materials. Multiple collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally non-linear bombarding processes. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin him formation. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：249 / 257

页数：9

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