0.25 μm gate-length, MBE-grown AlGaN/GaN HEMTs with high current and high fT

被引:7
作者
Kumar, V
Lu, W
Schwindt, R
Van Hove, J
Chow, P
Adesida, I
机构
[1] Univ Illinois, Dept Elect & Comp Engn, Microelect Lab, Urbana, IL 61801 USA
[2] SVT Associates, Eden Prairie, MN 55344 USA
关键词
D O I
10.1049/el:20010582
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
MBE-grown AlGaN/GaN high electron mobility transistors (HEMTs) on sapphire substrates have been fabricated. These 0.25 mum gate-length devices exhibited a maximum drain current density as high as 1.39 A/mm, a unity gain cutoff frequency (f(T)) of 67 GHz, and a maximum frequency of oscillation (f(max)) of 136 GHz. The f(T)of 67 GHz and f(max) of 136 GHz are the highest reported values for 0.25 mum gate-length GaN-bassd HEMTs.
引用
收藏
页码:858 / 859
页数:2
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