Raman and XPS studies of DLC films prepared by a magnetron sputter-type negative ion source

被引:166
作者
Paik, N [1 ]
机构
[1] Plasmion Corp, Elect Coatings, Hoboken, NJ 07030 USA
关键词
Raman study; DLC films; magnetron sputter-type negative ion source;
D O I
10.1016/j.surfcoat.2004.08.073
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The characteristics of diamond-like carbon (DLC) films deposited on a 4-in. Si (100) substrate using a magnetron sputter-type negative ion source (MSNIS) were investigated using Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) method. In the MSNIS source, a negative ion beam is generated by a cesium-induced sputter-type secondary negative ion emission process. DLC films deposited using this MSNIS technique were compared with films prepared using a conventional magnetron sputter process under various deposition conditions. Since the final energy of the negative ion arriving at the substrate is a function of the cathode voltage, the cathode voltage dependence of the film properties was investigated. As the applied voltage is increased, the more diamond-like properties were observed. Overall results suggest that the sp(3) bonding of DLC film can be effectively controlled using a MSNIS. (c) 2004 Elsevier B.V All rights reserved.
引用
收藏
页码:2170 / 2174
页数:5
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