Low-temperature luminescence study of GaN films grown by MBE

We report the results of low-temperature photoluminescence measurements on GaN films grown by molecular beam epitaxy on (0001) sapphire substrates. Samples were either nominally undoped or doped with Si. The spectra are generally dominated by a sharp peak at 3.47 eV which is attributed to excitons bound to neutral donors. A much weaker peak (or shoulder) near 3.45 eV probably arises from excitons bound to neutral accepters. On raising the temperature to 50 K, in some samples free exciton peaks can be partially resolved on the high-energy side of the main line. In others we believe that these free excitons are recaptured onto neutral accepters, thus enhancing the low-energy side of the line. A broader emission line appears in many samples at an energy near 3.42 eV which shows significant variation in position between samples. Our data show that it represents a free-to-bound, probably a free hole-to-donor, transition. This donor has previously been associated with oxygen. Of particular interest is the fact that some samples show a second sharp peak at 3.27 eV, together with a second broader peak at about 3.17 eV (also variable in energy). The sharp peak is energetically consistent with its being either a donor-acceptor or a free electron-to-bound hole transition, but subsidiary measurements rule out both these possibilities. We suggest that it may represent an exciton bound to a deep donor or a shallow donor-bound exciton in zinc blende GaN inclusions contained within the mainly wurtzite material. We tentatively interpret the 3.17 eV line as a phonon replica of this zinc blende line, the phonon energy being perturbed by the small size of the inclusions and by strain effects within these inclusions.