Growth morphology and structure of bismuth thin films on GaSb(110)

被引:7
作者
van Gemmeren, T
Lottermoser, L
Falkenberg, G
Bunk, O
Johnson, RL
Feidenhans'l, R
Nielsen, M
机构
[1] Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
[2] Riso Natl Lab, Condensed Matter Phys & Chem Dept, DK-4000 Roskilde, Denmark
关键词
bismuth; gallium antimonide; low index single crystal surfaces; metal-semiconductor interfaces; scanning tunneling microscopy; soft X-ray photoelectron spectroscopy; surface structure; morphology; roughness and topography; X-ray scattering; diffraction; and reflection;
D O I
10.1016/S0039-6028(98)00516-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Photoelectron spectroscopy, low-energy electron diffraction, scanning tunneling microscopy and surface X-ray diffraction were used to investigate the growth of thin layers of bismuth on GaSb(110). At submonolayer coverages, growth of two-dimensional islands occurs. A uniform (1 x I)-reconstruction is formed at a coverage of one monolayer. A structural model derived from X-ray diffraction data is presented for this phase. The (1 x I)-phase consists of zigzag chains of bismuth atoms bonded alternately to the surface cations and anions of the bulk-terminated unrelaxed (110) surface. We propose that the (1 x 1)-phases formed by antimony and bismuth adsorbates on (110) surfaces of other III-V compound semiconductors are also described by the epitaxial continued layer model. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:254 / 260
页数:7
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