Hole-Mask Colloidal Nano lithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates

被引：145

作者：

Cataldo, Stefano ^{[1
,2
]}

Zhao, Jun ^{[1
,2
]}

Neubrech, Frank ^{[3
]}

Frank, Bettina ^{[1
,2
]}

Zhang, Chunjie ^{[4
]}

Braun, Paul V. ^{[4
]}

Giessen, Harald ^{[1
,2
]}

机构：

[1] Univ Stuttgart, Inst Phys 4, D-70569 Stuttgart, Germany

[2] Univ Stuttgart, Res Ctr SCoPE, D-70569 Stuttgart, Germany

[3] Heidelberg Univ, Kirchhoff Inst Phys, D-69120 Heidelberg, Germany

[4] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA

来源：

ACS NANO | 2012年 / 6卷 / 01期

关键词：

hole-mask colloidal nanolithography; large-area low-cost metamaterials; antenna-enhanced SEIRA substrate; RING; SPECTROSCOPY; EXCITATION; RESONANCES; ARRAYS;

D O I：

10.1021/nn2047982

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We use low-cost hole-mask colloidal nanolithography to manufacture large-area resonant split-ring metamaterials and measure their infrared optical properties. This novel substrate Is employed for antenna-assisted surface-enhanced infrared absorption measurements using octadecanethiol (ODT) and deuterated ODT, which demonstrates easy adjustability of our material to vibrational modes. Our method has the potential to make resonant plasmon-enhanced infrared spectroscopy a standard lab tool in biology, pharmacology, and medicine.

引用

页码：979 / 985

页数：7

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