Surface treatment effects on the thickness dependence of the remanent polarization of PbZr0.52Ti0.48O3 capacitors

被引:29
作者
Contreras, JR
Kohlstedt, H
Poppe, U
Waser, R
Buchal, C
机构
[1] Forschungszentrum Julich, Inst Festkorperforsch, D-52425 Julich, Germany
[2] Forschungszentrum Julich, Inst Schichten & Grenzflachen, D-52425 Julich, Germany
关键词
D O I
10.1063/1.1590431
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this letter, we report on the thickness dependence of the remanent polarization of Pt/PbZr0.52Ti0.48O3/SrRuO3 capacitors. Two different patterning techniques were used to fabricate the capacitors. For lift-off processed capacitors, the remanent polarization decreased with decreasing thickness. Ion-beam-etched capacitors, however, showed a constant remanent polarization for all PbZr0.52Ti0.48O3 film thicknesses down to 23 nm. Remarkably, this constant remanent polarization for ion-beam-etched capacitors corresponds to the spontaneous polarization expected for a stress-free bulk PbZr0.52Ti0.48O3 crystal. (C) 2003 American Institute of Physics.
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页码:126 / 128
页数:3
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