Interface charge and nonradiative carrier recombination in Ga2O3-GaAs interface structures

被引:15
作者
Passlack, M [1 ]
Yu, Z
Droopad, R
Bowers, B
Overgaard, C
Abrokwah, J
Kummel, AC
机构
[1] Motorola Inc, Phoenix Corp Res Labs, Tempe, AZ 85284 USA
[2] Univ Calif San Diego, Dept Chem, La Jolla, CA 92093 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 01期
关键词
D O I
10.1116/1.590515
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated the dual role of interfacial defects in creating both nonradiative interface recombination and interface charge. Our studies are based on Ga2O3-GaAs interface structures with their unique properties such as low interface state density and radiative GaAs band-to-band recombination. The self-consistent analysis of the steady-state dependence of the spontaneous GaAs emission on excitation density provides all critical characteristics of interfacial defects simultaneously: the density of interface states, their capture cross sections, the interface recombination velocities, and the oxide charge. (C) 1999 American Vacuum Society. [S0734-211X(99)02401-4].
引用
收藏
页码:49 / 52
页数:4
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