Self-consistent particle simulation of three-dimensional dc magnetron discharge

被引：37

作者：

Nanbu, K

Segawa, S

Kondo, S

机构：

来源：

VACUUM | 1996年 / 47卷 / 6-8期

关键词：

discharge plasma; magnetron; dc; particle simulation;

D O I：

10.1016/0042-207X(96)00114-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The structure of fully three-dimensional de magnetron discharge is clarified by the use of the PIC/MC method. Magnets are placed in the form of a racetrack with the practical dimensions of industrial sputtering apparatus. The cathode sheath is found only in the region between the two magnets. Plasma density is highest near the location of a double thickness of sheath. Plasma is widely distributed between the electrodes but its width is limited and equal to the gap between the magnets. Copyright (C) 1996 Elsevier Science Ltd.

引用

页码：1013 / 1016

页数：4

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