Optical metastability of subband gap (2.2 eV) yellow luminescence in GaN

被引:24
作者
Chang, YC
Oberhofer, AE
Muth, JF
Kolbas, RM [1 ]
Davis, RF
机构
[1] N Carolina State Univ, Dept Elect & Comp Engn, Raleigh, NC 27695 USA
[2] N Carolina State Univ, Dept Mat Sci & Engn, Raleigh, NC 27695 USA
关键词
D O I
10.1063/1.1381417
中图分类号
O59 [应用物理学];
学科分类号
摘要
Optical metastability has been studied in undoped GaN films grown on SiC substrates having a previously deposited AlN buffer layer. Brief exposures to a higher intensity ultraviolet light resulted in temporary changes in the optical properties of the GaN layer. The photoinduced changes created high contrast patterns on samples that could be observed under an optical microscope with lower intensity ultraviolet excitation. The subband gap yellow photoluminescence peak at 2.2 eV increased significantly after the patterns were created. This change slowly returned (hours) to its initial value at room temperature. The retention time decreased to a few seconds at temperatures above 100 degreesC. The data showed that a 1.34 eV thermal activation energy exists, which suggests that the cause of these metastable properties is related to the subband gap yellow luminescence. (C) 2001 American Institute of Physics.
引用
收藏
页码:281 / 283
页数:3
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